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Semiconductor Ultrapure Water Polishing

An advisory review of a fab's UPW polishing loop proposed a primary-RO and EDI reconfiguration to hold resistivity at 18.2 MΩ·cm.

18.2
MΩ·cm
<1
ppb TOC
30%
Less Reject

The Challenge

A semiconductor fab saw resistivity excursions and rising TOC in its ultrapure water polishing loop, threatening wafer yield as the make-up water quality drifted seasonally.

For electronics & semiconductor operators, a challenge of this kind translates straight into cost and risk — higher chemical and energy use, lost capacity, a heavier maintenance burden and, ultimately, the threat of a discharge-consent breach. The reliable route is to measure the actual stream first, understand what is really driving the problem, and only then select and size the treatment. That diagnostic discipline is where Reynolds & Bauhm began this engagement.

The Proposed Solution

Reynolds & Bauhm was engaged as the consulting engineer on this project. Working alongside the site team, we characterised the stream and proposed a solution sized to the measured duty rather than a catalogue specification. The recommended approach combined several coordinated measures:

  • Make-up RO reconfigured to two-pass with pH-elevated second pass for TOC/boron
  • EDI polishing repositioned downstream of UV-185 TOC reduction
  • Continuous resistivity, TOC and boron monitoring with trend alarms
  • Reject staging proposed to cut overall water rejection

Advisory engagement

Reynolds & Bauhm acted in an advisory capacity — assessing the problem and proposing and sizing the solution. This is a representative scenario showing how we approach a electronics & semiconductor challenge of this type; figures are typical of the technology proposed, and every project is validated against your own data.

How the Solution Was Scoped

Each stage was selected against the stream analysis and sized with a sensible design margin, then set out as a process flow diagram and functional design specification for the client to take forward. Reynolds & Bauhm defined the duty, the equipment selection and the control philosophy, and identified the interface and performance risks to resolve before implementation. The proposal included a commissioning and validation plan — instrument calibration, control-loop tuning against live conditions, operator training and O&M documentation — so that, once built by the project team, the plant could meet its targets from start-up and stay there.

Expected Outcome

ParameterBeforeAfter (target)
Product resistivity17.5 MΩ·cm18.2 MΩ·cm
TOC8 ppb<1 ppb
Water rejectedbaseline−30%

Beyond the headline figures, the proposed approach targets reliable, repeatable compliance and a measurable reduction in operating cost — the combination that justifies the investment and protects the site against tightening regulation.

Why This Approach Works

Diagnose before designing

The proposed train is built around a real stream analysis, not an assumption — the single biggest determinant of whether a electronics & semiconductor plant succeeds.

Right technology for the duty

Each stage earns its place against the measured load, avoiding both under-treatment and the cost of over-engineering.

Validated & documented

A commissioning and validation plan means the result is provable and auditable, not just claimed.

Transferable

The same engineering approach transfers to comparable electronics & semiconductor sites with similar duties.

Related Case Studies & Pages

Have a similar challenge?

Reynolds & Bauhm can assess feasibility and propose a validated, sized solution for your electronics & semiconductor application. Send us your flow, stream analysis and target consent and we will scope the treatment train, size it and set out the options.

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